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Development and validation of a mathematical model for the chemical vapor deposition of silica from mixtures of chlorosilanes- carbon dioxide- and hydrogen

Nitodas; SF; Sotirchos; SV

Journal: JOURNAL OF THE ELECTROCHEMICAL SOCIETY Year: 2002 Volume: 149 Issue: 2 Pages: C120-C129
DΟΙ: https://doi.org/10.1149/1.1432672