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Molecular composition and orientation of interstitial versus surface silicon oxides for Si(111)/SiO2 and Si(100)/SiO2 interfaces using FT-IR and X-ray photoelectron spectroscopies

Kandilioti; G; Siokou; A; Papaefthimiou; V; Kennou; S; Gregoriou; VG

Journal: APPLIED SPECTROSCOPY Year: 2003 Volume: 57 Issue: 6 Pages: 628-635
DΟΙ: https://doi.org/10.1366/000370203322005300