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Effects of residence time and reaction conditions on the deposition of silica- alumina- and aluminosilicates from CH3SiCl3- AlCl3- CO2- and H-2 mixtures

Sotirchos; SV; Nitodas; SF

Journal: CHEMICAL VAPOR DEPOSITION Year: 2001 Volume: 7 Issue: 4 Pages: 157-166
DΟΙ: https://doi.org/10.1002/1521-3862(200107)7:4<157::AID-CVDE157>3.0.CO;2-P